http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4756989-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5128cfc84a0fb189fceb3cd240c44493 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0217 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-18 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-021 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-36 |
filingDate | 1985-07-10^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 1988-07-12^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2b9aa4c993ee82093343b9fb4749c88 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ee8bf0a8fbf6f0b6f5dc6509ae3d308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf375c484c2e030434c36eb49c909623 |
publicationDate | 1988-07-12^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | US-4756989-A |
titleOfInvention | Image-forming materials sensitive to high-energy beam |
abstract | Disclosed is an image-forming material having a high sensitivity to high-energy beams and excellent in dry etching resistance, heat stability and resolution which comprises a copolymer containing a total of 1 to 99 mole-% of at least one of recurring structural units represented by the following formulas [A] and [A'] and 1 to 99 mole-% of at least one recurring structural unit represented by the following formula [B] and having a number-average molecular weight of 500 to 1,000,000: <IMAGE> [A] <IMAGE> [A'] <IMAGE> [B] wherein R1 of the formulas [A] and [A'] represents a hydrogen or halogen atom, or an alkyl group having 1 to 6 carbon atoms, the substituent groups R1, epoxy group, and thiiranyl group being attached to the position ortho, meta, or para to the carbon atom in the main chain; X, Y, and Z of the formula [B] represent each a hydrogen atom, halogen atom, cyano group, alkyl group having 1 to 6 carbon atoms, halogenated alkyl group having 1 to 6 carbon atoms, aryl group having 6 to 30 carbon atoms and bearing a substituent alkyl or halogenated alkyl group having 1 to 6 carbon atoms, aryl group having 6 to 30 carbon atoms, -COOR2, -COR2, -O-COR2 (wherein R2 represents an alkyl or halogenated alkyl group having 1 to 12 carbon atoms, aryl group having 6 to 30 carbon atoms and bearing a substituent alkyl or halogenated alkyl group having 1 to 6 carbon atoms, or aryl group having 6 to 30 carbon atoms), nitro group, substituent group containing a hetero ring bearing substituent R3 (R3 represents a hydrogen atom, hydroxyl group, carboxyl group, halogen atom, nitro group, amino group, cyano group, alkyl or halogenated alkyl group having 1 to 6 carbon atoms, or aryl group having 6 to 30 carbon atoms), or substituent group containing a silicon atom. An image forming method using this material and an image-forming element are also disclosed. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104704008-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104704008-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7018784-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015259456-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9321871-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0903638-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6572980-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6251567-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004043330-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5468812-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5250395-A |
priorityDate | 1984-07-11^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
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