| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
1987-05-20^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1990-02-20^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbdeb35ed9bb63e0b282d7997935ef68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4df86aacf914a8ac378d80e6d93cda11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_810741ddb0c667bf3fab2184caf944f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfb1f2381d29f622389f2f673c6031a0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fbb3e46230391982f2fea7b459be7d08 |
| publicationDate |
1990-02-20^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4902770-A |
| titleOfInvention |
Undercoating material for photosensitive resins |
| abstract |
The undercoating composition of the invention, useful for providing an undercoating layer for a top coat of a photosensitive resist layer on a substrate surface, comprises, as a principal ingredient thereof, a condensation product obtained by the condensation reaction between a hydroxy-substituted diphenylamine and a melamine compound substituted on the nitrogen atoms with methylol groups and/or alkoxymethyl groups. The undercoating obtained of the composition is highly resistant against the attack by the overcoating solution applied thereon so that the fidelity of the pattern reproduction by the photolithographic technique is greatly improved by virtue of the absence of any disorder at the interface between the undercoating and top coat layers. The advantage is further increased when the undercoating composition further comprises a photoextinctive agent, e.g. a dye, having absorptivity in the wave length region where the photosensitive resist of the top coat has sensitivity. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5260172-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103827159-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103827159-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1705519-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1705519-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5223372-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5250395-A |
| priorityDate |
1984-03-06^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |