Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
filingDate |
1991-12-17^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
1993-11-09^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78ebd41b7d878a0149ab3fb979a92d41 |
publicationDate |
1993-11-09^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-5260172-A |
titleOfInvention |
Multilayer photoresist comprising poly-(vinylbenzoic acid) as a planarizing layer |
abstract |
The present invention relates to an improved process for forming a multilayer resist image comprising a planarizing layer of poly(vinylbenzoic acid). |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014242787-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007051697-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7419611-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007066750-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005277064-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8128832-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8618002-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9704724-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011241173-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7488771-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8637602-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8529779-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009107953-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7229745-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008169268-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009092767-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6268108-B1 |
priorityDate |
1991-12-17^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |