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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
filingDate 1991-12-17^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1993-11-09^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78ebd41b7d878a0149ab3fb979a92d41
publicationDate 1993-11-09^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5260172-A
titleOfInvention Multilayer photoresist comprising poly-(vinylbenzoic acid) as a planarizing layer
abstract The present invention relates to an improved process for forming a multilayer resist image comprising a planarizing layer of poly(vinylbenzoic acid).
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014242787-A1
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priorityDate 1991-12-17^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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