http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5414746-A

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filingDate 1993-11-01^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1995-05-09^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1cbf30a8313b514b04ee18b637d906d5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb362574a1f39be05d9c2f062c8114c7
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publicationDate 1995-05-09^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5414746-A
titleOfInvention X-ray exposure mask and fabrication method thereof
abstract An X-ray exposure mask comprises an X-ray transmission layer and an X-ray absorption layer formed on the X-ray transmission layer and being patterned. The X-ray absorption layer has a first region having a first thickness and a second region having a second thickness less than the first thickness.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102955354-B
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03034476-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5906910-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7197108-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6043164-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9223198-B2
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priorityDate 1991-04-22^^<http://www.w3.org/2001/XMLSchema#date>
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