| abstract |
A plasma treatment system ( 10 ) and related methods for rapidly treating a workpiece ( 56 ) with ions from a plasma having an ion density that is reproducibly uniform and symmetrical. The processing chamber ( 12 ) of the plasma treatment system ( 10 ) includes a chamber ( 14 ) lid having a symmetrical array of apertures ( 192 ) and further includes a vacuum distribution baffle ( 180 ), which are both configured to uniformly disperse a process gas adjacent the surface of the workpiece ( 56 ). The uniform dispersion of process gas and a symmetrical placement of the workpiece within the chamber ( 12 ) contribute to providing a uniformly dense plasma of ions adjacent the workpiece ( 56 ). A treatment system control ( 304 ) automates the operation of the system and controls the flow of process gas, evacuation of the chamber, and the application of the plasma excitation power to minimize the length of a treatment cycle and to optimize the uniformity of the plasma treatment. |