| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8b479030db5460b3c2c6f011d90852d1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_46f6b459c61b18bcc0bd03d85219d26d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32577
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01R19-0061
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32541
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01P3-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01P3-48 |
| filingDate |
2009-07-07^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-10-01^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbf6c983eeee4998faa9c20644e8d9e6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e552ebc2bb0a44c739a46820381a817 |
| publicationDate |
2013-10-01^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8547085-B2 |
| titleOfInvention |
Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber |
| abstract |
An arrangement for measuring process parameters within a processing chamber is provided. The arrangement includes a probe arrangement disposed in an opening of an upper electrode. Probe arrangement includes a probe head, which includes a head portion and a flange portion. The arrangement also includes an o-ring disposed between the upper electrode and the flange portion. The arrangement further includes a spacer made of an electrically insulative material positioned between the head portion and the opening of the upper electrode to prevent the probe arrangement from touching the upper electrode. The spacer includes a disk portion configured for supporting an underside of the flange portion. The spacer also includes a hollow cylindrical portion configured to encircle the head portion. The spacer forms a right-angled path between the o-ring and an opening to the processing chamber to prevent direct line-of-sight path between the o-ring and the opening to the processing chamber. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11670490-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019103295-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11043388-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9153421-B2 |
| priorityDate |
2008-07-07^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |