| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate |
2005-09-02^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2008-09-02^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78ebd41b7d878a0149ab3fb979a92d41
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_901bba1d8970b251d0f1aaaacaf56b09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a49796a3f9f7f861cbb25d2c0d513c7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a29acea57d89d336e5ab2522d59a99e3 |
| publicationDate |
2008-09-02^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7419611-B2 |
| titleOfInvention |
Processes and materials for step and flash imprint lithography |
| abstract |
A method of forming an image. The method includes: a transfer layer on a substrate; forming on the transfer layer, an etch barrier layer; pressing a template having a relief pattern into the etch barrier layer; exposing the etch barrier layer to actinic radiation forming a cured etch barrier layer having thick and thin regions corresponding to the relief pattern; removing the template; removing the thin regions of the cured etch barrier layer; removing regions of the transfer layer not protected by the etch barrier layer; removing regions of the substrate not protected by the transfer layer and any remaining etch barrier layer; and removing remaining transfer layer. The transfer layer may be removed using a solvent, the etch barrier layer may include a release agent and an adhesion layer may be formed between the transfer layer and the etch barrier layer. A reverse tone process is also described. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010055611-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012309135-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8168109-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8168691-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011042862-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008081154-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010173247-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8053164-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007029686-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010201043-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7597813-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8617988-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8084185-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008169268-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8128832-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7670747-B2 |
| priorityDate |
2005-09-02^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |