| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_51d028c578ae85cb937b5b34a5129fbc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2005-03-29^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2008-12-02^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01283a9d1001d9f6e29ea0f6e696807e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd7065d1fd7e73823a9e20beb2607c58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d354b852ff5ddfa4c0cb6e6fc1f50dad |
| publicationDate |
2008-12-02^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7459260-B2 |
| titleOfInvention |
Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method |
| abstract |
A modified EUV photoresist and a method of making the resist. The modified resist includes an EUV photoresist and a LAM incorporated into the EUV photoresist. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9110369-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10353290-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9081280-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9067909-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9046767-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9029065-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9256125-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9389506-B2 |
| priorityDate |
2005-03-29^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |