http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7524745-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e41962dc4b8b176668446cbbc0d46fde |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B31-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B33-005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B33-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B31-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| filingDate | 2002-05-14^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2009-04-28^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3c1b7080e4cab6be1610f5d905156c1 |
| publicationDate | 2009-04-28^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7524745-B2 |
| titleOfInvention | Method and device for doping, diffusion and oxidation of silicon wafers under reduced pressure |
| abstract | Method and device for doping or diffusion, or oxidation of silicon wafers ( 4 ), the wafers being introduced into the chamber ( 2 ) of an oven ( 1 ) wherein is introduced at least a gas for performing the doping or diffusion or oxidation process. The method comprises simultaneously with the introduction and passage of gas into the chamber ( 2 ) of the oven ( 1 ), continuously subjecting the latter to a depression of constant value. The device comprises an oven ( 1 ) provided with a chamber ( 2 ) wherein are introduced the wafers, the oven including at least an inlet tube ( 5 a, 5 b, 5 c ) for introducing at least a gas into the chamber ( 2 ) to carry out the processes and at least an outlet tube ( 6 ) for extracting the gas whereto is connected a suction unit ( 7 ) for generating in the chamber ( 2 ) a constant and controlled depression. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008292430-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8460468-B2 |
| priorityDate | 2001-05-14^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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