| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_30cd1609afb645373a5d66036b56b04e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_244aca1ab1656c43d5140882ddce0939
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e377e25ea9275d2d5977548b5cbb7f0b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6de3993fc900c000913797da6a0ef805 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F27B17-0025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B31-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67103
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B31-10 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-22 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00 |
| filingDate |
2012-08-01^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-06-11^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1aaa25c0b9359e8769164fee0c9d54f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b24eb0a5741b2e7805e35b1b3a483cd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_514b9ee67fb171cef31b6600ece8489c |
| publicationDate |
2013-06-11^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8460468-B2 |
| titleOfInvention |
Device for doping, deposition or oxidation of semiconductor material at low pressure |
| abstract |
A device for doping, deposition or oxidation of semiconductor material at low pressure in a process tube, is provided with a tube closure as well as devices for supplying and discharging process gases and for generating a negative pressure in the process tube. A closure of the process chamber that is gas tight with respect to the process gases and the vacuum tight seal of the end of the tube closure are spatially separated from each other in relation to the atmosphere and are arranged on a same side of the process tube in such a manner that a bottom of a stopper, sealing the process chamber, rests against a sealing rim of the process tube and the tube closure end is sealed vacuum tight by a collar, which is attached to the process tube and against which a door rests sealingly. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10323323-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9920844-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10229845-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11661654-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016195331-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9631276-B2 |
| priorityDate |
2007-05-21^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |