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filingDate 2008-10-07^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2012-04-03^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-8148191-B2
titleOfInvention Combined etching and doping media
abstract The present invention relates firstly to HF/fluoride-free etching and doping media which are suitable both for the etching of inorganic layers and also for the doping of underlying layers. The present invention secondly also relates to a process in which these media are employed.
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