| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_545971b31cc3212f1f6b42bad3753cba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0d4553e0b38982159d2f17a43c537fcd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1c30e4c6b3615c3a5d796facd9cf063a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6831
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B6-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2012-06-13^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-12-25^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d40f1f38a8138d63e3fa6bac928acac9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5db902db558996e1002b925524fe7066
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7f3e474ef35f7caae4c3394055bd957 |
| publicationDate |
2012-12-25^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8337629-B2 |
| titleOfInvention |
Method for cleaning elements in vacuum chamber and apparatus for processing substrates |
| abstract |
To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the particles to scatter by utilizing the Coulomb force, a means for introducing a gas into the vacuum chamber and causing the particles sticking to the element to scatter by causing a gas shock wave to hit the element, a means for heating the element and causing the particles to scatter by utilizing the thermal stress and thermophoretic force, or a means for causing the particles to scatter by applying mechanical vibrations to the element. The thus scattered particles are removed by carrying them in a gas flow in a relatively high pressure atmosphere. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9612178-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9757776-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011160889-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014182357-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8649893-B2 |
| priorityDate |
2003-08-25^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |