| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9933a8c4f0a7a00cb425f016cf5f8476
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_126086c0ee6d8508c3c05cb54805a5fe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d7b042517596461030d190d7e2e7bf2c |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4402
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4557
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45578 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-22 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00 |
| filingDate |
2010-02-23^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-01-01^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e54ff73950dc3b4712237f17953d872
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8b3d1db3717055d8f6a51db995f943a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7561f6f335d07d39e8491bd07b5e619e |
| publicationDate |
2013-01-01^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8343277-B2 |
| titleOfInvention |
Substrate processing apparatus |
| abstract |
To inhibit a diffusion of particles into a processing chamber and reduce a cost required for exchanging a gas filter. A substrate processing apparatus comprises: a processing chamber processing substrates; a gas supply part supplying processing gas into the processing chamber; wherein the gas supply part has a gas supply nozzle disposed in the processing chamber; a filter removing impurities contained in the processing gas; and a gas supply port opened in the gas supply nozzle, for supplying into the processing chamber the processing gas from which impurities are removed by the filter. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9159591-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10669632-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8590484-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10903053-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012073500-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10974184-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10395900-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018244034-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10933620-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013167774-A1 |
| priorityDate |
2009-02-23^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |