| abstract |
Vapor deposition particles ( 91 ) discharged from at least one vapor deposition source opening ( 61 ) pass through a plurality of limiting openings ( 82 ) of a limiting unit ( 80 ) and a plurality of mask openings ( 71 ) of a vapor deposition mask ( 70 ), and adhere to a substrate ( 10 ) that relatively moves along a second direction ( 10 a ) so as to form a coating film. The limiting unit includes a plurality of plate members stacked on one another. Accordingly, it is possible to efficiently form a vapor deposition coating film in which edge blurring is suppressed on a large-sized substrate at a low cost. |