Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-00 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7684 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76879 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76888 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76846 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53238 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7685 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76849 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76856 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76855 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76858 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76865 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76873 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-528 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02172 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76831 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-528 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
filingDate |
2015-10-14^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2017-03-21^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd1eff20686f563ab9b55803b4d60ae6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3aeb5f10fc31c69d2a550aaa09d4866 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6661cb26c3fead557c7e38ff4bc5ef44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54443ef5fcf8a61f8bace955b10bd972 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2fb600092ac5037697409b19e15078da |
publicationDate |
2017-03-21^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-9601371-B2 |
titleOfInvention |
Interconnect structure with barrier layer |
abstract |
Low capacitance and high reliability interconnect structures and methods of manufacture are disclosed. The method includes forming a copper based interconnect structure in an opening of a dielectric material. The method further includes forming a capping layer on the copper based interconnect structure. The method further includes oxidizing the capping layer and any residual material formed on a surface of the dielectric material. The method further includes forming a barrier layer on the capping layer by outdiffusing a material from the copper based interconnect structure to a surface of the capping layer. The method further includes removing the residual material, while the barrier layer on the surface of the capping layer protects the capping layer. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11289372-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10593591-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11264345-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10224241-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11171084-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018090371-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11232983-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11515202-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10325806-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018082894-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11011418-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10770347-B2 |
priorityDate |
2014-08-22^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |