http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9721750-B2

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_da1568abf4abdfb458e0e2b839d41d40
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-028
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3171
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-05
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317
filingDate 2015-07-28^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-08-01^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29b712b48ae3f31ea6bd8a9b0e04bbd5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_149f4f2f23d9c3b783ab68e71ad3fe7a
publicationDate 2017-08-01^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9721750-B2
titleOfInvention Controlling contamination particle trajectory from a beam-line electrostatic element
abstract Provided herein are approaches for controlling particle trajectory from a beam-line electrostatic element. In an exemplary approach, a beam-line electrostatic element is disposed along a beam-line of an electrostatic filter (EF), and a voltage is supplied to the beam-line electrostatic element to generate an electrostatic field surrounding the beam-line electrostatic element, agitating a layer of contamination particles formed on the beam-line electrostatic element. A trajectory of a set of particles from the layer of contamination particles is then modified to direct the set of particles to a desired location within the EF. In one approach, the trajectory is controlled by providing an additional electrode adjacent the beam-line electrostatic element, and supplying a voltage to the additional electrode to control a local electrostatic field in proximity to the beam-line electrostatic element. In another approach, the trajectory is influenced by one or more geometric features of the beam-line electrostatic element.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019198283-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10468224-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021090845-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-D956005-S
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021020399-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11011343-B2
priorityDate 2015-07-28^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010163725-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5298720-A
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