| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7a30229049d842bb65e1043b878bc46c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3b1979064a86b9b2965e66d5909b116f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c6e47c8ce5ab61f012890e7008a9eb7d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2400-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N24-085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01R33-323
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F120-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1812
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-00 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F120-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N24-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 |
| filingDate |
2011-10-14^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-08-15^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9e325a3a798200b9506eb19ca09d84b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84e985fae91822e7ae6de99171472261
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_134805d1b38cbff6702cbb3731e52f79 |
| publicationDate |
2017-08-15^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9733564-B2 |
| titleOfInvention |
Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions |
| abstract |
A target variable analysis unit ( 11 ) calculates the triad fractions of monomer units in the composition of a known polymer sample from the copolymerization reactivity ratios of the monomer units to obtain a target variable. A waveform processing unit ( 12 ) processes NMR measurements, signals, etc. An explanatory variable analysis unit ( 13 ) obtains explanatory variables from the amount of chemical shift and signal strength in the NMR measurements of the known sample. A model generation unit ( 14 ) determines the regression equation of the regression model of the target variable and the explanatory variables by partial least squares regression, and obtains regression model coefficients. A sample analysis unit ( 15 ) uses the regression model to calculate the triad fractions for an unknown copolymer sample from the amount of chemical shift and signal strength in the NMR measurements of the unknown copolymer sample. By using a copolymer for lithography in which the total of the triad fractions obtained in this way is not more than 20 mole % in the copolymer, a resist composition with excellent solubility and sensitivity can be manufactured. |
| priorityDate |
2010-10-18^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |