http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03107442-A3

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filingDate 2003-06-17^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5de60fa7abe597cc93296081fa9d7af
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publicationDate 2004-09-02^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-03107442-A3
titleOfInvention ELECTRODE FOR P-TYPE GALLIUM NITRIDE SEMICONDUCTORS
abstract The invention relates to an improved electrode for a p-type gallium nitride semiconductor material. This electrode comprises a layer of oxidized metal and a first and a second layer of metallic material. The electrode is formed by depositing at least three metal layers on the p-type semiconductor layer so that at least one metal layer is in contact with the p-type semiconductor layer. At least two metal layers are then subjected to the annealing treatment in the presence of oxygen to oxidize at least one metal layer to form a metal oxide. The electrodes provide p-type gallium nitride semiconductor materials with good ohmic contact and therefore reduce the operating voltage of gallium nitride semiconductor devices.
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