| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e75dbe74a46e1e3af10225913a7bfb4b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_097405822d505467fd50f7100022cd56 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B21-082 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B21-082 |
| filingDate |
2017-10-27^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b10af9a49df1a58d264bd29f19d0357e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b00bd0eef33e1f4df4ab41de4dbd324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7f99152bc76315a6b89e3a921cd3f33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ae4fd7ea9abfee9dba0188b88614bd3c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4e49dd718dffbeb216b9d598e6a10d1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fe79137bd1bb2fa04343b2684977e96 |
| publicationDate |
2018-05-03^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2018079744-A1 |
| titleOfInvention |
Silicon oxynitride material and method for producing same |
| abstract |
The present disclosure provides a porous silicon oxynitride material. The silicon oxynitride material is amorphous, and can have a mode pore diameter of 0.1 to 1.2 nm inclusive. The silicon oxynitride material can be produced by subjecting a polyalkoxysilazane having a structural unit represented by general formula (1) to a heat treatment at 400 to 1000ºC inclusive.n(1) [R 1 O-Si-(NH) 3/2 ] (wherein R 1 represents a hydrocarbon group having 1 to 20 carbon atoms.) |
| priorityDate |
2016-10-27^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |