| abstract |
The invention provides an active light-sensitive or radiation-sensitive resin composition, an active light-sensitive or radiation-sensitive film, a blank mask with an active light-sensitive or radiation-sensitive film, a pattern forming method, and the manufacture of electronic devices Methods, electronic devices and novel compounds. The active light-sensitive or radiation-sensitive resin composition of the present invention is characterized by containing an alkali-soluble resin (A) and a crosslinking agent (C) represented by the following general formula (1-0). [chemical formula 1] |