| abstract |
PROBLEM TO BE SOLVED: To provide high stability of colloidal silica when polishing a mirror surface of various kinds of semiconductor device surfaces, magnetic disk surfaces, etc., particularly metal surfaces, stable polishing characteristics for a long time, high precision and high quality. An object of the present invention is to provide a polishing composition capable of obtaining a mirror surface and a polishing method using the same. A polishing composition comprising water, cationic colloidal silica, and a metal nitrate. |