| abstract |
An electrostatic chuck that uses a Coulomb force and that reduces particles adhering to a substrate while maintaining an attractive force. An electrostatic chuck includes a base, an electrode that is formed on the base and generates a Coulomb force, and a first main surface on a side that supports a substrate. A dielectric layer 13 having a plurality of protrusions 13a that support the substrate 1, the distance between the protrusions 13a is provided substantially evenly, and the surface roughness (Ra) of the upper surface of the protrusion is 0.5 μm or less, The height of the protrusion 13a is 5 to 20 μm, the number of the protrusions 13a per unit area 100 cm 2 of the first main surface is A (pieces / 100 cm 2 ), and the height of the protrusion 13 a is B (μm). As a result, the relationship of the formula A 1/2 × B 2 > 200 is satisfied. [Selection] Figure 1 |