http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016031451-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_de498babb0c04a00ceb653738877b147 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-60 |
| filingDate | 2014-07-29^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73f94813386c2735b9e35d36489f1a87 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5780f980006f9a3dcc0c8abda77a7743 |
| publicationDate | 2016-03-07^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2016031451-A |
| titleOfInvention | Composition for removing mask blanks and method for removing mask blanks |
| abstract | An object of the present invention is to flatten the surface of a glass substrate after processing when removing mask blanks such as a molybdenum silicide film, a molybdenum silicide oxide film, and a molybdenum silicide nitride film formed on a glass substrate. It is an object of the present invention to provide a composition having a good processing speed and a high processing speed and a removing method using the composition. The composition of the present invention comprises (A) 0.01 to 50% by mass of a hydrogen peroxide component; (B) 0.01 to 1% by mass of an ammonium fluoride component; and (C) phosphoric acid and sulfuric acid. And an aqueous solution containing at least one acid component selected from nitric acid, and the pH of the aqueous solution is in the range of 1 to 3. [Selection figure] None |
| priorityDate | 2014-07-29^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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