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filingDate 2018-05-30^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-01-19^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe7b5667f11dffe1bcdff1b94ed94eee
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publicationDate 2021-01-19^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-10896973-B2
titleOfInvention Oxide-nitride-oxide stack having multiple oxynitride layers
abstract An embodiment of a semiconductor memory device including a multi-layer charge storing layer and methods of forming the same are described. Generally, the device includes a channel formed from a semiconducting material overlying a surface on a substrate connecting a source and a drain of the memory device; a tunnel oxide layer overlying the channel; and a multi-layer charge storing layer including an oxygen-rich, first oxynitride layer on the tunnel oxide layer in which a stoichiometric composition of the first oxynitride layer results in it being substantially trap free, and an oxygen-lean, second oxynitride layer on the first oxynitride layer in which a stoichiometric composition of the second oxynitride layer results in it being trap dense. In one embodiment, the device comprises a non-planar transistor including a gate having multiple surfaces abutting the channel, and the gate comprises the tunnel oxide layer and the multi-layer charge storing layer.
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