| abstract |
Improved susceptor means for supporting a series of substrates to be coated with a film in a chemical vapor deposition reactor. The susceptor means comprises a supporting frame structure positioned within a reaction chamber surrounded by a source of heat energy. A plurality of separable discrete susceptor slabs, each of which is formed from a material which is capable of absorbing the heat energy emanating from the heat source, are heated to insure uniform eating of the substrates carried by the slabs. The susceptor slabs are supported in a generally vertical orientation at a slight angle to the vertical to insure maintenance of the substrates in recesses formed therein without requiring additional retaining means. The susceptor means is separable from the reaction chamber to facilitate attachment of the susceptor slabs to the frame structure thereof. The susceptor slabs are separable from the frame structure so that the slabs may be horizontally oriented to facilitate loading of substrates therein prior to attachment of the susceptor slabs to the frame structure. The frame structure is operatively connectable with means for rotating the frame structure within the reaction chamber to insure uniform heating of the substrates carried thereby. |