http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6682575-B2

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filingDate 2002-03-05^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2004-01-27^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6682575-B2
titleOfInvention Methanol-containing silica-based CMP compositions
abstract The invention provides a polishing composition comprising (a) a silica abrasive, (b) methanol, and (c) a liquid carrier, wherein the polishing composition has a pH of about 1 to about 6, and the polishing composition is colloidally stable. The invention also provides a method for polishing a substrate comprising a silicon-based dielectric layer using the polishing composition. The invention further provides a method of stabilizing a silica abrasive in a polishing composition by contacting the abrasive with methanol.
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