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filingDate 2008-03-05^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2011-08-16^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2011-08-16^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7998866-B2
titleOfInvention Silicon carbide polishing method utilizing water-soluble oxidizers
abstract The inventive method comprises chemically-mechanically polishing a substrate comprising at least one layer of silicon carbide with a polishing composition comprising a liquid carrier, an abrasive, and an oxidizing agent.
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