http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00801
Outgoing Links
| Predicate | Object |
|---|---|
| concordantIPC | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00 |
| level | 10^^<http://www.w3.org/2001/XMLSchema#integer> |
| symbol | B81C1/00801 |
| modified | 2013-01-01^^<http://www.w3.org/2001/XMLSchema#date> |
| title | Avoid alteration of functional structures by etching, e.g. using a passivation layer or an etch stop layer |
| type | http://data.epo.org/linked-data/def/cpc/SubGroup |
| broader | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00785 |
Incoming Links
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